Process window qualification modulation layouts
US12235224B2 · kind B2 · utility
0Cited by
6References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2022 |
| Grant date | Feb 25, 2025 |
| Priority date | — |
| Expiry date | Aug 4, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95676
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Process window qualification (PWQ) layouts can be used to determine a presence of a pattern anomaly associated with the pattern, patterning process, or patterning apparatus. For example, a modulated die or field can be compared to a slightly lower offset modulated die or field. In another example, the high to low corners for a particular condition or combination of conditions are compared. In yet another example, process modulation parameters can be used to estimate criticality of particular weak points of interest.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.