Patent · US Active

Holding system for holding substrates during a processing of the surfaces of the substrates

US12241154B2 · kind B2 · utility

0Cited by
11References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 16, 2020
Grant dateMar 4, 2025
Priority date
Expiry dateAug 19, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB05B13/0242
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The invention relates to a holding system (1) for holding substrates (12) for use in a surface processing system having a covering area (20), comprising a plurality of fixing elements (2), a body (24) arranged within the covering area (20) for receiving the fixing elements (2), and a positioning element (26) for adjusting the covering and a machining area (20, 22), wherein a plurality of substrates (12) can be fixed by the fixing elements (2) and processed within the machining area (22).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.