Max Siebert
16Patents
2h-index
36Co-inventors
46Inventor score
Filing activity: Feb 7, 2014 → Dec 16, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10385236B2 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Electricity | 2 | Active |
| US9138381B2 | Production of inorganic-organic composite materials by reactive spray-drying | Performing Operations; Transporting | 2 | Active |
| US10072326B2 | Versatile holder for treating the surface of rod-shaped substrates | Electricity | 2 | Active |
| US10899945B2 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates | Electricity | 2 | Active |
| US11590528B2 | Tool fixture for multiple process steps | Emerging Cross-Sectional Technologies | 1 | Active |
| USD881242S1 | Tool holder | General | 1 | Active |
| US10844325B2 | Composition for post chemical-mechanical-polishing cleaning | Chemistry; Metallurgy | 0 | Active |
| US11264250B2 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Chemistry; Metallurgy | 0 | Active |
| US10738219B2 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Chemistry; Metallurgy | 0 | Active |
| US11993729B2 | Chemical mechanical polishing composition | Electricity | 0 | Active |
| US11286402B2 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Electricity | 0 | Active |
| US10570316B2 | Chemical mechanical polishing (CMP) composition | Chemistry; Metallurgy | 0 | Active |
| US10844333B2 | Composition for post chemical-mechanical-polishing cleaning | Chemistry; Metallurgy | 0 | Active |
| US10227506B2 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Electricity | 0 | Active |
| US10865361B2 | Composition for post chemical-mechanical-polishing cleaning | Chemistry; Metallurgy | 0 | Active |
| US12241154B2 | Holding system for holding substrates during a processing of the surfaces of the substrates | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.