Patent · US Active

Monitoring radical particle concentration using mass spectrometry

US12265057B2 · kind B2 · utility

0Cited by
12References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 29, 2024
Grant dateApr 1, 2025
Priority date
Expiry dateMar 29, 2044

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J49/282
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.