Patent · US Active

Selective EMI shielding using preformed mask with fang design

US12266615B2 · kind B2 · utility

0Cited by
2References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 27, 2023
Grant dateApr 1, 2025
Priority date
Expiry dateFeb 27, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3025
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor device has a semiconductor package including a substrate comprising a land grid array. A component is disposed over the substrate. An encapsulant is deposited over the component. The land grid array remains outside the encapsulant. A fanged metal mask is disposed over the land grid array. A shielding layer is formed over the semiconductor package. The fanged metal mask is removed after forming the shielding layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.