Mirror, in particular for microlithography

US12276917B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jan Horn · Munich, DE
• Mohammad Awad · Abu Dhabi, AE
• Kerstin Hild · Schwäbisch Gmünd, DE

Key dates

• Filing date: Nov 28, 2022
• Grant date: Apr 15, 2025
• Expiry date: Jul 7, 2043

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10N30/87
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A mirror including a substrate (110), a reflection layer system (120), and at least one continuous piezoelectric layer (130, . . . ) arranged between the substrate and the layer system. An electric field producing a locally variable deformation is applied to the piezoelectric layer via a first, layer-system-side electrode arrangement and a second, substrate-side electrode arrangement. At least one of the electrode arrangements is assigned a mediator layer (170) setting an at least regionally continuous profile of the electrical potential along the respective electrode arrangement. The electrode arrangement to which the mediator layer is assigned has a plurality of electrodes (160, . . . ), each of which is configured to receive an electrical voltage relative to the respective other electrode arrangement. In the region that couples two respectively adjacent electrodes, the mediator layer is subdivided into a plurality of regions (171, . . . ) that are electrically insulated from one another.