Plasma antenna and apparatus for generating plasma having the same
US12278088B2 · kind B2 · utility
0Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2020 |
| Grant date | Apr 15, 2025 |
| Priority date | — |
| Expiry date | Jun 29, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32183
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.