Photoresist compositions and pattern formation methods
US12282254B2 · kind B2 · utility
0Cited by
6References
17Claims
0Family size
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Key dates
| Filing date | Sep 30, 2021 |
| Grant date | Apr 22, 2025 |
| Priority date | — |
| Expiry date | Sep 30, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/327
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polymer, comprising a first repeating unit derived from a first monomer comprising a single ester acetal group, and a second repeating unit derived from a second monomer comprising a plurality of ester acetal groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.