Plasma reaction device
US12283464B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2020 |
| Grant date | Apr 22, 2025 |
| Priority date | — |
| Expiry date | Jan 6, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32669
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided is a plasma reaction device which can reduce a heating value through installation of a dual-coil type inductor in a resonant network circuit part, and a cooling method thereof. The plasma reaction device may include: a reactor part for exciting an input gas to be in a plasma state by using transformer coupled plasma; a resonant network circuit part electrically connected to the reactor part and including at least one inductor and at least one condenser; and a power supply part for applying power to the resonant network circuit part, wherein the inductor may comprise: a first coil which is formed between a first terminal and a second terminal and at least a portion of which is spirally wound to form a first cylindrical reception space inward; and a second coil which is formed between the first terminal and the second terminal to be connected to the first coil in series, and spirally wound in the first cylindrical reception space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.