Method and/or system for coating a substrate
US12283499B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2022 |
| Grant date | Apr 22, 2025 |
| Priority date | — |
| Expiry date | May 4, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/0486
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system and/or method for coating a substrate. The system may include a chuck for holding and rotating the substrate, a dispensing subsystem for dispensing a coating material onto the substrate, and a shield member. The shield member may be movable towards and away from the substrate during the coating procedure. The shield member may have an inverted funnel shape. The shield member may include a central chamber through which a solvent vapor flows and a peripheral chamber that is fluidly separated from the central chamber through which a gas flows. During a coating procedure, the shield member may be moved very close to the substrate and the solvent vapor and gas may flow onto the substrate to create a solvent rich ambient around the substrate and prevent aerosols of the coating material from redepositing onto the substrate after being flung off due to spinning of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.