Gas container and deposition system including the same
US12287064B2 · kind B2 · utility
0Cited by
5References
11Claims
0Family size
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Key dates
| Filing date | Sep 30, 2020 |
| Grant date | Apr 29, 2025 |
| Priority date | — |
| Expiry date | Nov 14, 2041 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF17C1/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition system and a gas storage device, the deposition system including a process chamber; and a gas supply outside of the process chamber, the gas supply being configured to provide monochlorosilane, wherein the gas supply includes a cabinet; and a gas container inside the cabinet, and the gas container includes aluminum (Al).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.