Composition comprising three alkanolamines and a hydroxylamine for removing etch residues
US12298669B2 · kind B2 · utility
0Cited by
5References
11Claims
0Family size
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Key dates
| Filing date | Sep 24, 2020 |
| Grant date | May 13, 2025 |
| Priority date | — |
| Expiry date | Mar 13, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method and cleaning composition for microelectronic devices or semiconductor substrates including at least one alkanolamine; at least one hydroxylamine or derivatives of hydroxylamine or mixtures thereof; at least one polyfunctional organic acid with at least two carboxylic acid groups and water. The cleaning compositions can further include at least one corrosion inhibitor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.