Inventor · Macungie, PA, US

Aiping Wu

21Patents
3h-index
31Co-inventors
59Inventor score

Filing activity: Feb 3, 2005 → Mar 28, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US8361237B2 Wet clean compositions for CoWP and porous dielectrics Physics 20 Active
US7879782B2 Aqueous cleaning composition and method for using same Chemistry; Metallurgy 7 Active
US7534753B2 pH buffered aqueous cleaning composition and method for removing photoresist residue Chemistry; Metallurgy 6 Active
US7879783B2 Cleaning composition for semiconductor substrates Chemistry; Metallurgy 3 Active
US9042142B2 Multi-level voltage converter Electricity 3 Active
US8772214B2 Aqueous cleaning composition for removing residues and method using same Chemistry; Metallurgy 2 Active
US10400167B2 Etching compositions and methods for using same Electricity 1 Active
US9201308B2 Water-rich stripping and cleaning formulation and method for using same Chemistry; Metallurgy 1 Active
US10073351B2 Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation Chemistry; Metallurgy 1 Active
US12110435B2 Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device Electricity 1 Active
US7888302B2 Aqueous based residue removers comprising fluoride Chemistry; Metallurgy 1 Active
US7682458B2 Aqueous based residue removers comprising fluoride Chemistry; Metallurgy 0 Active
US12281251B2 Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device Electricity 0 Active
US12298669B2 Composition comprising three alkanolamines and a hydroxylamine for removing etch residues Chemistry; Metallurgy 0 Active
US12325844B2 Photoresist remover Chemistry; Metallurgy 0 Active
US8518865B2 Water-rich stripping and cleaning formulation and method for using same Chemistry; Metallurgy 0 Active
US8283260B2 Process for restoring dielectric properties Electricity 0 Active
US11091727B2 Post etch residue cleaning compositions and methods of using the same Chemistry; Metallurgy 0 Active
US8288330B2 Composition and method for photoresist removal Electricity 0 Active
US9536730B2 Cleaning formulations Physics 0 Active
US8889609B2 Cleaning formulations and method of using the cleaning formulations Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.