Semiconductor processing tool and methods of operation
US12298672B2 · kind B2 · utility
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3References
20Claims
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Key dates
| Filing date | Aug 9, 2023 |
| Grant date | May 13, 2025 |
| Priority date | — |
| Expiry date | Aug 9, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Some implementations described herein provide an exposure tool and associated methods of operation in which a scanner control system generates a scanner route for an exposure recipe such that the distance traveled by a substrate stage of the exposure tool along the scanner route is reduced and/or optimized for non-exposure fields on a semiconductor substrate. In this way, the scanner control system increases the productivity of the exposure tool, reduces processing times of the exposure tool, and increases yield in a semiconductor fabrication facility in which the exposure tool is included.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.