Determining lithographic matching performance
US12306545B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2020 |
| Grant date | May 20, 2025 |
| Priority date | — |
| Expiry date | Feb 11, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.