Patent · US Active

Projection exposure apparatus having a device for determining the concentration of atomic hydrogen

US12306551B2 · kind B2 · utility

0Cited by

1References

19Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dirk Heinrich Ehm · Beckingen, DE
Moritz Becker · Stuttgart, DE

Key dates

Filing date	Mar 23, 2022
Grant date	May 20, 2025
Priority date	—
Expiry date	Oct 8, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG01N25/18
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A projection exposure apparatus (1) for semiconductor lithography has a device for determining the concentration of atomic hydrogen in a plasma (29) in the region of an optical element (25, 25.1), wherein the device includes a sensor (32, 32.1, 32.2, 32.3, 32.4), In this case, the device includes a filter element (31, 31.1,31.2, 31.3, 31.4) arranged between the region of the plasma (29) and the sensor (32, 32.1, 32.2, 32.3, 32.4), wherein the filter element (31, 31.1,31.2, 31.3, 31.4) is configured to predominantly allow the passage of atomic hydrogen from the plasma (29) to the sensor (32, 32.1, 32.2, 32.3, 32.4).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.