Moritz Becker
25Patents
6h-index
35Co-inventors
65Inventor score
Filing activity: Sep 8, 2006 → Oct 21, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8938783B2 | Security language expressions for logic resolution | Physics | 27 | Active |
| US8095969B2 | Security assertion revocation | Electricity | 16 | Active |
| US8060931B2 | Security authorization queries | Physics | 13 | Active |
| US8656503B2 | Security language translations with logic resolution | Physics | 11 | Active |
| US8584230B2 | Security authorization queries | Physics | 9 | Active |
| US8201215B2 | Controlling the delegation of rights | Physics | 8 | Active |
| US8296822B2 | State-updating authorization | Physics | 5 | Active |
| US8010560B2 | Abducing assertion to support access query | Physics | 4 | Active |
| US8407807B2 | Dynamic assertion providers for logic-based security policy languages | Physics | 3 | Active |
| US8839344B2 | Access policy analysis | Physics | 3 | Active |
| US8607311B2 | Delegation in logic-based access control | Physics | 3 | Active |
| US9251342B2 | Evaluating detectability of information in authorization policies | Physics | 2 | Active |
| US9160738B2 | Delegation-based authorization | Electricity | 1 | Active |
| US8339576B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US10061205B2 | Reflective optical element | Physics | 1 | Active |
| US11307505B2 | Method for operating an optical apparatus, and optical apparatus | Physics | 0 | Active |
| US12287588B2 | Method for operating an EUV lithography apparatus, and EUV lithography apparatus | Physics | 0 | Active |
| US12306551B2 | Projection exposure apparatus having a device for determining the concentration of atomic hydrogen | Physics | 0 | Active |
| US10627217B2 | Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system | Physics | 0 | Active |
| US10712677B2 | Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning | Physics | 0 | Active |
| US11137687B2 | Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma | Physics | 0 | Active |
| US11199363B2 | Method for removing a contamination layer by an atomic layer etching process | Emerging Cross-Sectional Technologies | 0 | Active |
| US10649340B2 | Reflective optical element for EUV lithography | Physics | 0 | Active |
| US9874175B2 | External heat engine device | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US9282121B2 | Security language translations with logic resolution | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.