Patent · US Active

Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography process

US12307334B2 · kind B2 · utility

0Cited by

0References

25Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dirk Seidel · Jena, DE
Alexander Freytag · Erfurt, DE
Christian Wojek · Aalen, DE
Susanne Töpfer · Müncheroda, DE
Carsten Schmidt · Jena, DE
Christoph Husemann · Jena, DE

Key dates

Filing date	Jan 4, 2021
Grant date	May 20, 2025
Priority date	—
Expiry date	Dec 17, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG06N20/10
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

The present invention relates to a method for evaluating a statistically distributed measured value in the examination of an element for a photolithography process, comprising the following steps: (a) using a plurality of parameters in a trained machine learning model, wherein the parameters characterize a state of a measurement environment in a time period assigned to a measurement of the measured value; and (b) executing the trained machine learning model in order to evaluate the measured value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.