Substrate processing apparatus and substrate processing method
US12308258B2 · kind B2 · utility
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2References
17Claims
0Family size
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Key dates
| Filing date | Dec 24, 2020 |
| Grant date | May 20, 2025 |
| Priority date | — |
| Expiry date | Oct 21, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31111
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
At least part of a processing liquid upward flowing in a storage space is split into a plurality of upflows and guided to a substrate held by a substrate holder. Many upflows are widely dispersed and formed in the processing liquid stored in the storage space, and the generation of downflows in the storage space is suppressed. As a result, bubbles are uniformly supplied to the substrate and substrate processing can be performed in high quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.