Patent · US Active

Methods and tools for electrical property depth profiling using electro-etching

US12313669B2 · kind B2 · utility

0Cited by
23References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 21, 2023
Grant dateMay 27, 2025
Priority date—
Expiry dateAug 13, 2043

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R31/2648
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

In some embodiments, a method includes forming a mini chamber over a test region, the mini chamber comprising an inlet, an outlet and an electrode, introducing an electrolyte solution into the mini chamber through the inlet, applying an electro-etching potential difference between the electrode and at least one contact region and reducing the thickness of a semiconductor film portion at the test region forming a thinned down semiconductor film portion, replacing the electrolyte solution in the mini chamber with a fluid that is substantially insulating, and determining the electrical property of the thinned down semiconductor film portion while the fluid is in the mini chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.