Projection exposure apparatus for semiconductor lithography
US12321105B2 · kind B2 · utility
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13References
20Claims
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Key dates
| Filing date | Sep 15, 2022 |
| Grant date | Jun 3, 2025 |
| Priority date | — |
| Expiry date | Dec 5, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus for semiconductor lithography comprises an optical element and a temperature recording device for detecting a temperature on a surface of the optical element via electromagnetic radiation emanating from the surface of the optical element. The temperature recording device can comprise a filter for filtering the electromagnetic radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.