Timo Laufer
20Patents
3h-index
35Co-inventors
59Inventor score
Filing activity: Sep 27, 2003 → Sep 22, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9316929B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 7 | Active |
| US10031423B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 3 | Active |
| US7524072B2 | Optical component, comprising a material with a predetermined homogeneity of thermal expansion | Physics | 3 | Expired |
| US7557902B2 | Projection objective | Physics | 3 | Expired |
| US11372341B2 | Method for temperature control of a component | Electricity | 2 | Active |
| US7428037B2 | Optical component that includes a material having a thermal longitudinal expansion with a zero crossing | Physics | 1 | Expired |
| US9383328B2 | Lithography apparatus | Physics | 1 | Active |
| US8339569B2 | Temperature-control device for an optical assembly | Physics | 1 | Active |
| US11187989B2 | Method for determining properties of an EUV source | Physics | 1 | Active |
| US8698999B2 | Protection module for EUV lithography apparatus, and EUV lithography apparatus | Physics | 1 | Active |
| US11022903B2 | Method for temperature control of a component | Electricity | 1 | Active |
| US9134504B2 | Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9639007B2 | Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US12140877B2 | Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus | Physics | 0 | Active |
| US12321106B2 | Device for detecting a temperature, installation for producing an optical element and method for producing an optical element | Physics | 0 | Active |
| US12321105B2 | Projection exposure apparatus for semiconductor lithography | Physics | 0 | Active |
| US10684551B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
| US10317802B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
| US9746778B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
| US10466598B2 | Projection exposure apparatus for semiconductor lithography with increased thermal robustness | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.