Photoresist remover
US12325844B2 · kind B2 · utility
0Cited by
1References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2020 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Mar 15, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Cleaning compositions and the method of using the same are disclosed, where the compositions include one or more alkanolamines, one or more ether alcohol solvents or aromatic containing alcohol, one or more corrosion inhibitors, and optionally one or more secondary solvents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.