Precursor delivery system and method for cyclic deposition
US12325914B2 · kind B2 · utility
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21Claims
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Key dates
| Filing date | Jan 25, 2022 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Feb 5, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L23/53266
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The disclosed technology relates generally to semiconductor manufacturing, and more particularly to precursor delivery in cyclic deposition. In one aspect, a method of depositing a thin film comprises alternatingly exposing a substrate in a thin film deposition chamber to a plurality of precursors. Exposing the substrate comprises introducing one of the precursors into the thin film deposition chamber through two or more atomic layer deposition (ALD) valves each configured to supply the one of the precursors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.