Inspection apparatus and inspection method
US12326407B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2023 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | May 23, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/37
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.