Patent · US Active

Measurement method for interferometrically determining a surface shape

US12332043B2 · kind B2 · utility

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6References
10Claims
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Key dates

Filing dateSep 22, 2021
Grant dateJun 17, 2025
Priority date
Expiry dateMar 13, 2043

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B2290/30
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Measurement method for interferometrically determining a shape of a test object (14) surface (12) includes arranging a first diffractive optical element (30, 130, 230) in an input wave (18) beam path, to generate a first test wave (34) with a wavefront that is adapted to a desired shape of the optical surface, detecting a first interferogram generated by the first test wave after interaction with the test object surface, arranging a different diffractive optical element (32, 232) in the input wave beam path for generating a further test wave with a wavefront which is adapted to the desired shape of the optical surface, the first and the further diffractive optical elements differing in their respective diffraction structure configurations, capturing a further interferogram generated by the further test wave after interaction with the test object surface, and determining the surface shape of the test object by calculating the two interferograms.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.