Physical vapor deposition (PVD) with target erosion profile monitoring
US12334319B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2023 |
| Grant date | Jun 17, 2025 |
| Priority date | — |
| Expiry date | Jun 20, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A physical vapor deposition (PVD) system includes: a chamber body; a substrate support disposed within the chamber body and capable of supporting a substrate; a PVD target; and a target profile monitoring subsystem. The PVD target includes: a target plate comprising a target material; and a backing plate attached to the target plate and comprising: a central section; and a peripheral section circumferentially surrounding the central section in a horizontal plane. The peripheral section has a first thickness in a vertical direction, the central section has a second thickness in the vertical direction, and the first thickness is larger than the second thickness. The target profile monitoring subsystem is configured to monitor usage of the target plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.