Chia-Hsi Wang
12Patents
0h-index
10Co-inventors
41Inventor score
Filing activity: Jun 20, 2014 → Sep 22, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US12180576B2 | PVD target design and semiconductor devices formed using the same | Electricity | 0 | Active |
| US12359307B2 | In situ and tunable deposition of a film | Electricity | 0 | Active |
| US11462394B2 | Physical vapor deposition apparatus and method thereof | Electricity | 0 | Active |
| US11823878B2 | Deposition apparatus, deposition target structure, and method | Electricity | 0 | Active |
| US11725270B2 | PVD target design and semiconductor devices formed using the same | Electricity | 0 | Active |
| US12165898B2 | Adjustable wafer chuck | Electricity | 0 | Active |
| US12094698B2 | Physical vapor deposition apparatus and method thereof | Electricity | 0 | Active |
| US10113228B2 | Method for controlling semiconductor deposition operation | Electricity | 0 | Active |
| US12198927B2 | Deposition system and method | Electricity | 0 | Active |
| US11688591B2 | Physical vapor deposition apparatus and method thereof | Electricity | 0 | Active |
| US12334319B2 | Physical vapor deposition (PVD) with target erosion profile monitoring | Electricity | 0 | Active |
| US12237159B2 | Deposition apparatus, deposition target structure, and method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.