Patent · US Active

Dielectric film-forming composition

US12338309B2 · kind B2 · utility

0Cited by
30References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 4, 2024
Grant dateJun 24, 2025
Priority date
Expiry dateMar 4, 2044

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D3/38
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

This disclosure relates to a dielectric film-forming composition that includes at least one cyclized polydiene resin, and one or both of at least one reactive functional compound and at least one catalyst.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.