Plasma showerhead with improved uniformity
US12340980B2 · kind B2 · utility
0Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 1, 2022 |
| Grant date | Jun 24, 2025 |
| Priority date | — |
| Expiry date | Jan 21, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3222
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Plasma showerheads with improved gas uniformity, and a plasma showerhead with angled gas nozzles are disclosed. Also disclosed are gas nozzles having a vertical offset angle and/or a directional offset angle. None of the gas channels and/or the gas nozzles intersect with the plasma regions of the showerhead.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.