Apparatus for processing substrate
US12341028B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2023 |
| Grant date | Jun 24, 2025 |
| Priority date | — |
| Expiry date | Feb 28, 2044 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B3/022
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for processing a substrate includes a first bowl and a processing space therein; a first support portion disposed in the processing space and configured to support the substrate in a first support position; a second bowl disposed to move in a first direction in the processing space; a second support portion configured to move upwardly and downwardly with respect to the first support portion to support the substrate between the second support position disposed above the first support position and the third support position, and to move in the first direction; and a cleaning unit including a first cleaning portion disposed below the substrate toward a rear surface of the substrate in the first support position and a second cleaning portion disposed below the substrate and opposing a rear surface of the substrate between the second support position and the third support position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.