Method of fabricating pellicle structure
US12346022B2 · kind B2 · utility
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5References
20Claims
0Family size
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Key dates
| Filing date | Sep 20, 2022 |
| Grant date | Jul 1, 2025 |
| Priority date | — |
| Expiry date | Oct 6, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a pellicle structure includes forming a metal layer on a temporary substrate, forming a membrane on the metal layer, exposing a bottom surface of the metal layer by separating the temporary substrate from the metal layer, and exposing a bottom surface of the membrane by etching the exposed bottom surface of the metal layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.