Device and method for regulating and controlling incident angle of light beam in laser interference lithography
US12346030B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 1, 2021 |
| Grant date | Jul 1, 2025 |
| Priority date | — |
| Expiry date | Jul 3, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.