Method for heating an optical element in a microlithographic projection exposure apparatus and optical system
US12353141B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Jun 27, 2023 |
| Grant date | Jul 8, 2025 |
| Priority date | — |
| Expiry date | Nov 19, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of heating an optical element in a microlithographic projection exposure apparatus and an optical system includes using a heating arrangement to introduce a heating power into the optical element. The heating power is regulated based on a setpoint value. The setpoint value is varied over time during the operation of the projection exposure apparatus. Varying the setpoint value for the heating power comprises a simulation of the effects of changes in the heating power relative to the actual value thereof based on a model for the thermal behavior of the optical element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.