DRC test pattern generation method and apparatus, electronic device, and storage medium
US12361196B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 8, 2022 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | Feb 21, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2119/18
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A DRC test pattern generation method includes: receiving a DRC test pattern generation request, the DRC test pattern generation request carrying the number of correct patterns and the number of erroneous patterns; acquiring layout design rule information and corresponding layer configuration information, the layer configuration information including process layer configuration parameter information that is set according to a process type; parsing parameter information corresponding to each rule in the layout design rule information and the process layer configuration parameter information in the layer configuration information, and generating formatted parameter information corresponding to the each rule; and generating a corresponding number of correct patterns and a corresponding number of erroneous patterns corresponding to each rule according to the formatted parameter information.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.