Mask inspection for semiconductor specimen fabrication
US12361535B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2021 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | Feb 8, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V2201/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
There is provided a system and method for mask inspection, comprising: obtaining a plurality of images, each representative of a respective part of the mask; generating a CD map of the mask comprising a plurality of composite values of a CD measurement of a POI respectively derived from the plurality of images, comprising, for each given image: dividing the given image into a plurality of sections; searching for the POI in the plurality of sections, giving rise to a set of sections, each with presence of at least one of the POI therein; for each section, obtaining a value of the CD measurement using a printing threshold, giving rise to a set of values of the CD measurement corresponding to the set of sections; and combining the set of values to a composite value of the CD measurement corresponding to the given image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.