Method of operating scanning electron microscope (SEM) and method of manufacturing semiconductor device using the same
US12362138B2 · kind B2 · utility
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Key dates
| Filing date | Aug 2, 2022 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | Oct 13, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/27
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A scanning electron microscope (SEM) includes an electron gun, a deflector, an objective lens, first and second detectors each configured to detect emission electrons emitted from the wafer based on the input electron beam being irradiated on the wafer, a first energy filter configured to block electrons having energy less than a first energy among emission electrons emitted from a wafer based on an input electron beam from being detected by the first detector, and a second energy filter configured to block electrons having energy less than second energy among the emission electrons from being detected by the second detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.