Vacuum systems in semiconductor fabrication facilities
US12371780B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2022 |
| Grant date | Jul 29, 2025 |
| Priority date | — |
| Expiry date | Jul 20, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods and devices are provided wherein rotational gas-flow is generated by vortex generators to decontaminate dirty gas (e.g., gas contaminated by solid particles) in pumping lines of vacuum systems suitable for use at a semiconductor integrated circuit fabrication facility. The vacuum systems use filterless particle decontamination units wherein rotational gas-flow is applied to separate and trap solid particles from gas prior to the gas-flow entering a vacuum pump. Methods are also described whereby solid deposits along portions of pumping lines may be dislodged and removed and portions of pumping lines may be self-cleaning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.