Method for determining an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured
US12372431B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2022 |
| Grant date | Jul 29, 2025 |
| Priority date | — |
| Expiry date | Apr 11, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
To determine an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured of the optical system and/or to qualify the phase effect of a test structure, a test structure that is periodic in at least one dimension is initially arranged in an object plane of the optical system. An initial illumination angle distribution for illuminating the test structure with an initial pupil region, whose area is less than 10% of a total pupil area, is specified and the test structure is illuminated thereby in different distance positions relative to the object plane. In this way, an initial measured aerial image of the test structure is determined. Specifying the illumination distribution, illuminating and determining the aerial image are then repeated for a further illumination angle distribution and an imaging contribution of the optical system is determined from a comparison of the measured aerial images, the imaging quality parameter to be determined and/or a complex-valued diffraction spectrum of the test structure being determined from said imaging contribution. A metrology system for carrying out the method comprises a holder for the test struc…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.