Projection exposure apparatus for semiconductor lithography

US12372877B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Markus Raab · Stilzendorf, DE
• Andreas Raba · Niederschönenfeld, DE
• Mirko Buechsenschuetz · Schweinfurt, DE
• Matthias Manger · Neukochen, DE

Key dates

• Filing date: Jun 22, 2023
• Grant date: Jul 29, 2025
• Expiry date: Jan 18, 2044

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70266
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.