Iodine-containing metal compound and composition for depositing thin film including the same
US12384805B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Feb 7, 2023 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | Apr 20, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Provided are an iodine-containing metal compound, a composition for depositing a metal-containing thin film including the same, and a method of manufacturing a metal-containing thin film using the same. Since the composition for depositing a thin film according to one embodiment is present in a liquid state at room temperature, it has excellent storage and handling properties, and since the composition has high reactivity, a metal thin film may be efficiently formed using the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.