Plasma source, and atomic clock employing plasma source
US12389520B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2022 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | Mar 24, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/24
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A small plasma source that enables highly efficient discharge in an ultra-high vacuum state includes a first magnet, a second magnet arranged so that a second magnetic pole faces the first magnetic pole of the first magnet, a third magnet having the second magnetic pole directed in the same direction as the first magnetic pole of the first magnet and arranged to surround the first magnet, a fourth magnet having the first magnetic pole different from the second magnetic pole facing the second magnetic pole of the third magnet and arranged to surround the second magnet, a first electrode provided on sides of the first magnetic pole of the first magnet and the second magnetic pole of the third magnet, a second electrode facing the first electrode and provided on sides of the second magnetic pole of the second magnet and the first magnetic pole of the fourth magnet, and a third electrode arranged between the first electrode and the second electrode. A value obtained by dividing a shorter distance between a distance between the first magnet and the second magnet and a distance between the third magnet and the fourth magnet by an average value of thicknesses of the first to fourth magnet…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.