Optical system and lithography apparatus
US12393119B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2023 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Sep 21, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B7/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system for lithography apparatus comprises a movable element and a functional element having a first and second portions. The optical element is designed as an optical element or as a reference structure. The first portion is fastened to the movable element by a joining mechanism along a fastening plane. The second portion comprises a functional surface. The functional element comprises a decoupling device for decoupling by deformation the first portion from the second portion. The decoupling device is formed by a narrowing of the functional element. The narrowing is located laterally outside a region of the functional surface. The functional surface is a measurement surface which is suitable for acquisition for the purposes of positioning and/or orientating the movable element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.