Method for calibrating substrate errors of computer-generated hologram based on ray propagation in three-dimensional model statement of government interest
US12393162B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2024 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Oct 15, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2001/2247
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a method for calibrating computer-generated hologram substrate errors based on a ray propagation in three-dimensional model, which belongs to the application of holography in optical measurement. The calibration method mainly includes the following two steps: firstly, establishing a corresponding ray propagation in three-dimensional model according to an aspheric interference optical path with a computer-generated hologram; then, obtaining data of the shapes of the front and the rear surfaces and the thickness uniformity of the computer-generated hologram through a multi-surface measurement technology; and finally, calculating the substrate error of the computer-generated hologram by combining the ray propagation in three-dimensional model and the measurement data. Compared with the prior art, the present invention establishes a complete ray propagation in three-dimensional model in the aspheric interference measurement optical path to achieve the high-accuracy calibration of the computer-generated hologram substrate errors and improve the surface interference measurement accuracy with computer-generated hologram.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.