Patent · US Active

Method of adjusting wafer shape using multi-directional actuation films

US12394618B2 · kind B2 · utility

0Cited by
9References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 2, 2022
Grant dateAug 19, 2025
Priority date
Expiry dateNov 27, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/302
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Techniques herein include methods for coating a single layer actuator film or multi-layer actuator film on the backside of a wafer. The actuator film includes one or more chemical actuators. Chemical actuators are various molecules, crystals, chemical compounds and other chemical compositions that are capable of imposing directional stress in response to application of an external stimulus on the chemical actuator. The external stimulus can include a particular wavelength of light or polarization of light, or heat (or directed infrared radiation) or load, which can include load-responsive actuation or pressure-responsive actuation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.