Cantilever with etch chamber flow design
US12400834B2 · kind B2 · utility
0Cited by
8References
16Claims
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Assignee
Inventors
Key dates
| Filing date | Aug 18, 2021 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | May 23, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A cantilever for gas flow direction control configured to support an electrode housing bowl in an associated etch process chamber. The cantilever may have a cross-section that is circular, elliptical, or airfoil shaped. The shape of the cantilever induces the flow of gas and etch products within the chamber around the cantilever, reducing turbulence around the edge of a wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.