Inventor · Zhubei City, TW

Yung-Yao Lee

61Patents
3h-index
54Co-inventors
65Inventor score

Filing activity: Mar 9, 2011 → Mar 19, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US9841687B2 Synchronized integrated metrology for overlay-shift reduction Physics 27 Active
US8703368B2 Lithography process Physics 12 Active
US8852673B2 Defect monitoring for resist layer Physics 4 Active
US9646896B2 Lithographic overlay sampling Physics 3 Active
US9176396B2 Overlay sampling methodology Physics 2 Active
US8860941B2 Tool induced shift reduction determination for overlay metrology Physics 2 Active
US11244827B2 Semiconductor manufacturing method and apparatus thereof Physics 1 Active
US10875148B2 Apparatus and methods for chemical mechanical polishing Electricity 1 Active
US9772561B2 Semiconductor manufacturing method and tool Electricity 1 Active
US9766559B2 Edge-dominant alignment method in exposure scanner system Physics 1 Active
US11487210B1 Method and system of surface topography measurement for lithography Physics 1 Active
US10747128B2 Exposure method and exposure apparatus Electricity 1 Active
US11835866B2 Method and system of surface topography measurement for lithography Physics 1 Active
US10157741B1 Method of manufacturing a semiconductor structure Physics 1 Active
US11543754B1 Extractor piping on outermost sidewall of immersion hood apparatus Electricity 1 Active
US9188876B2 Method of determining overlay error and control system for dynamic control of reticle position Physics 1 Active
US10942329B1 Optical module structure Physics 1 Active
US10831110B2 Lithographic overlay correction and lithographic process Electricity 1 Active
US9164398B2 Overlay metrology method Physics 1 Active
US10691020B2 Apparatus for dispensing liquid material and method for fabricating semiconductor device Electricity 1 Active
US8476003B2 Iterative rinse for semiconductor fabrication Electricity 1 Active
US12292686B2 Semiconductor structure and manufacturing method thereof Electricity 0 Active
US11500299B2 Exposure method and exposure apparatus Electricity 0 Active
US9927719B2 Overlay sampling methodology Physics 0 Active
US12092958B2 Wafer stage and method of using Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.