Methods of forming nanostructures including metal oxides using block copolymer materials
US12400856B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Dec 6, 2022 |
| Grant date | Aug 26, 2025 |
| Priority date | — |
| Expiry date | Dec 6, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a second block and substantially without the activatable catalyst. The activatable catalyst is capable of generating catalyst upon application of activation energy, and the generated catalyst is capable of reacting with a metal oxide precursor to provide a metal oxide. A semiconductor structure comprises such self-assembled nanostructure on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.