Substrate inspection apparatus and substrate inspection method
US12405226B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 24, 2023 |
| Grant date | Sep 2, 2025 |
| Priority date | — |
| Expiry date | Mar 6, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706849
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A substrate inspection apparatus includes a light irradiator including an objective lens and a plurality of optical fibers. The objective lens is configured to irradiate light to an illumination area on a semiconductor substrate having a plurality of circuit pattern layers, the plurality of optical fibers are adjacent a periphery of the objective lens and are configured to irradiate the light to a peripheral area adjacent the illumination area. A light generator is configured to generate the light. The light generator is configured to change an irradiation angle of the light to selectively irradiate the light to one or more of the objective lens and the plurality of optical fibers. A light analyzer is configured to obtain images of the circuit pattern layers from the light reflected from the illumination area and the peripheral area. The light analyzer is configured to model each of the circuit pattern layers of the semiconductor substrate to obtain image models and to measure an overlay between the circuit pattern layers through the images and the image models.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.