Statistical shape and appearance modeling for volumetric geometry and intensity data
US12406456B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2023 |
| Grant date | Sep 2, 2025 |
| Priority date | — |
| Expiry date | Dec 1, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2219/2004
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An image-based approach for statistical shape and appearance modeling includes re-orienting (rotating/translating) training masks to align the training masks with a reference mask to provide corresponding re-orientation parameters, where the training masks represent 3-dimensional shapes of a population of objects and the reference mask represents a 3-dimensional shape of a reference object, deforming the re-oriented training masks based on the reference mask to provide displacement fields indicative of differences between a 3-dimensional shape of the reference mask and 3-dimensional shapes of the re-oriented training masks, re-orienting training backgrounds based on the re-orientation parameters, where the training backgrounds represent volumetric intensity data of the 3-dimensional images of the objects, deforming the re-oriented training backgrounds based on the displacement fields, combining the deformed training backgrounds and the displacement fields, and reducing a dimensionality of the combined deformed training backgrounds and displacement fields to provide a statistical shape and appearance model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.